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Home Science and Engineering Equipment Advanced Equipments Spin Coaters – Photolithography
Photoresponse Characteristics System
Photoresponse Characteristics System
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Cellar Quantum Dots Quatr
Cellar Quantum Dots Quatr

Spin Coaters – Photolithography

Product Code: Spin coater_001

MARKSTRONICS SPIN COATER includes

  • This spin coater coat the organic materials and metal oxides and all-in solutions.
  • The spin coater is a complete solution coating system.
  • The system contains the following elements:
  • Spin coater
  • Spin rate: 500-16000 RPM
  • 5 variable speed sequences
  • Film thickness range 10 nm -10 μm •
  • Easytouse and maintenance free design •Rotational
  • LCD touch screen
  • Vacuum chucks
  • Vacuum pump
  • Vacuum free chucks (optional)
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Category: Advanced Equipments
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Description

MARKSTRONICS SPIN COATER includes:

This spin coater coat the organic materials and metal oxides and all-in solutions.

The spin coater is a complete solution coating system.

Specifications

  • Spin rate: 100-12000 RPM
  • 3 spin coating methods
  • Static spin coating method
  • Dynamic spin coating method
  • Multi RPM spin coatig method
  • Nanofilm coating method
  • 5 variable RPM program or
  • 9 Variable RPM program
  • Acceleration: 1-5000 RPM/sec
  • Deceleration: 1-5000 RPM/sec
  • Film thickness range 10 nm -10 μm •
  • Easytouse and maintenance free design •Rotational
  • 7 Inch LCD touch screen
  • Vacuum chucks
  • Vacuum pump
  • Vacuum free chucks (optional)

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